Mr. Greg Johnson

Sr. Applications Development
ZEISS Research Microscopy Solutions
Probing
Peabody, MA
USA 01960

Papers:

FA Technique Selection for Front End Defect Localization in Bulk Semiconductor (Si) FA
AFM in SEM for device characterization and defect localization
Zero channel bias determination of device turn-on and the Seebeck effect in nanoprobing
A Correlative Microscopic Workflow For Nanoscale Failure Analysis and Characterization of Advanced Electronics Packages
Simple methods for evaluating junctions in IGBTs