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| Session 19: Nanotechnology and Nanoprobing | ||||
| Location: Ballroom B (Renaissance Austin Hotel) | ||||
| (Please check final room assignments on-site). | ||||
| Session Description: Fabrication technology advancements into the nanoscale regime have given rise to a plethora of analytical challenges. Development of novel analytical techniques is critical to facilitate a good understanding of the physics of nanostructures and their fail mechanisms. Mainstream “micro” analysis techniques have been successfully extended into the “nano” world enabling cutting edge nanoanalysis. In this session, the evolution of Atomic Force Probing as a powerful nanoanalytical technique will be elucidated through two presentations. Also to be presented is the effectiveness of nanoprobing used in conjunction with other traditional analytical methods on different types of soft fails. The final presentation discusses current induced failure in carbon nanofibers; a potential next generation interconnect material. | ||||
| Editor: | Mr. Phil Kaszuba IBM Microelectronics, Essex Junction, VT | |||
| Session Chair: | Mr. Phil Kaszuba IBM Microelectronics, Essex Junction, VT | |||
| 3:15 PM | Atomic Force Probe Kelvin Measurements of Large MOSFET Devices at Contact Level for Accurate Device Threshold Characteristics | |||
| 3:40 PM | Atomic Force Probe Analysis of Non-Visible Defects in Sub-100nm CMOS Technologies | |||
| 4:05 PM | 90nm Technology SRAM Soft Fail Analysis Using Nanoprobing and Junction Stain TEM | |||
| 4:30 PM | Nano-Probing Application on Characterization of 6T-SRAM Single Bit Failures with Different Gox Breakdown Defect | |||
| 4:55 PM | In Situ Electron Microscopy Study of Current-Induced Failure of Carbon Nanofibers | |||