29
Metrology and In-line Characterization - Posters

Wednesday, November 4, 2015: 1:30 PM-3:30 PM
Exhibit Hall D (Oregon Convention Center )
Session Chairs:  Mr. Bryan Tracy, Evans Analytical Group, Sunnyvale, CA and Dr. Huimeng Wu, Ion Beam Application, Carl Zeiss Microscopy, LLC, Peabody, MA
29.1
Failure Mechanism Studies and Elimination of Galvanic Corrosion (Al-Cu Cell)on Microchip Al Bondpads in Cupper Process
Dr. Younan Hua, WinTech Nano-Technology Services Pte. Ltd.
29.2
Characterization of 88/144 nm SOI Wafers Produced by Separate Process Technologies Using Optical Second Harmonic Generation
Mr. Marc Kryger, Femtometrix; Mr. John Changala, Femtometrix
See more of: Technical Program
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