34
Scanning Probe Analysis - Posters

Wednesday, November 4, 2015: 1:30 PM-3:30 PM
Exhibit Hall D (Oregon Convention Center )
Session Chairs:  Mr. Phil Kaszuba, 967H, Globalfoundries, Essex Junction, VT and Mr. Terence Kane, IBM, Hopewell Junction, NY
34.1
Case Study: Doping Profile Analysis for 30nm DRAM Devices Using SCM and SSRM
Mr. Hsiu-Pin Chen, Inotera Memories, Inc.; Dr. Jian-Shing Luo, Inotera Memories, Inc.; Ms. Ching-Shan Sung, Inotera Memories, Inc.; Mr. Chen-Kang Wei, Inotera Memories, Inc.; Mr. Kai-Lun Chiang, Inotera Memories, Inc.; Dr. Chia-Ming Yang, Chang Gung University; Mr. Hsueh-Chun Liao, Chang Gung University; Mr. Jahson Suo, Micron Technology; Mr. Shifeng Lu, Micron Technology
34.2
Environmental Control Scanning Nonlinear Dielectric Microscopy Measurements of p-n Structures, epi-Si Wafers, and SiC Crystal Defects
Dr. Jing-Jiang Yu, Hitachi High Technologies America, Inc.; Dr. Takehiro Yamaoka, Hitachi High-Tech Science Corporation; Mr. Satoshi Hasumura, Hitachi High-Tech Science Corporation; Dr. Ryusuke Hirose, Hitachi High-Tech Science Corporation; Mr. Kazunori Ando, Hitachi High-Tech Science Corporation; Mr. Katsunori Mizuguchi, Hitachi High-Tech Science Corporation
34.3
Carrier redistribution analysis of gate-biased SiC power-MOSFET using super-higher-order scanning nonlinear dielectric microscopy
Mr. Norimichi Chinone, Tohoku University; Prof. Yasuo Cho, Tohoku University
34.4
Observation of polarization and two dimensional electron gas in AlGaN/GaN heterostructure using scanning nonlinear dielectric microscopy
Mr. Kotaro Hirose, Tohoku University; Mr. Norimichi Chinone, Tohoku University; Prof. Yasuo Cho, Tohoku University
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