Sample Preparation and Device Deprocessing - Poster

Wednesday, November 9, 2016: 1:30 PM-3:30 PM
Chairs:  Dr. Zhigang Song, Globalfoundries, Hopewell Junction, NY
Co-chairs:  Dr. Erwin Hendarto, LatticeGear, Beaverton, OR
Innovative Laser Process for Gel removal
Mr. G. B. Anderson, Infineon Technologies
Physical Failure Analysis (PFA) Techniques For Front-End-Of-Line (FEOL) Defect Analysis
Mr. Dirk Andrew Doyle, Maxim Integrated - Hillsboro; Mr. Fritz Christian Awitan, Maxim Integrated - Philippines; Lawrence Benedict, Maxim Integrated - Hillsboro
Studies on A Novel Qualification Method of the Silicon Nitride
Dr. Younan Hua, WinTech Nano-Technology Services Pte. Ltd.
Pulse Laser Ablation Techniques for IC Package Substrate Modifications and Validation
Mr. Matthew M. Mulholland, Intel Corporation; Ahmed A. Helmy, Intel Corporation; Anthony V. Dao, Intel Corporation
Sample Preparation Challenges in Removing Copper Pillar WLCSP Device Embedded in PCB Module for Electrical Testing and Failure Analysis
Mr. Kah Chin Cheong, ON Semiconductor
Decapsulation of IC Package by Atmospheric Microwave Plasma Needle
Dr. Martin Kral, Nippon Scientific Co., Ltd.; Dr. Masashi Kando, Plasma Applications Co., Ltd.; Dr. Marius Gabriel blajan, Plasma Applications Co., Ltd.; Mr. Yoichi Tsujita, Nippon Scientific Co., Ltd.; Mr. Satoshi Suzuki, Nippon Scientific Co., Ltd.; Mr. Yasutoshi Yamaichi, Nippon Scientific Co., Ltd.; Mr. Naoto Ohta, Nippon Scientific Co., Ltd.
MEMS Failure Analysis In Wafer Fabrication
Ms. Ng Hui Peng, GLOBALFOUNDRIES Singapore Pte Ltd; Mr. Ang Ghim Boon, GLOBALFOUNDRIES Singapore Pte Ltd; Ms. Angela Teo, GLOBALFOUNDRIES Singapore Pte Ltd; Quah Alfred, GLOBALFOUNDRIES Singapore Pte Ltd; Mr. Dayanand Nagalingam, GLOBALFOUNDRIES Singapore Pte Ltd; Dr. Xu Nai Yun, GLOBALFOUNDRIES Singapore Pte Ltd; Dr. Chen Changqing, GLOBALFOUNDRIES Singapore Pte Ltd; Dr. Mai Zhi Hong, GLOBALFOUNDRIES Singapore Pte Ltd; Dr. Jeffrey C. Lam, GLOBALFOUNDRIES Singapore Pte Ltd
IDENTIFICATION OF WET CHEMICAL DEPROCESSING INDUCED ARTIFACTS – A COMMON PROBLEM AFFECTING ALL MOS AND CMOS TECHNOLOGIES
Mr. Raymond G. Mendaros, Analog Devices General Trias (ADGT); Mr. Bernardino Mazon, Analog Devices Inc; Christian Renan Marquez, Analog Devices Inc
Locating Gate Oxide Failures Using KOH
Ms. Lori Sarnecki, ON Semiconductor
See more of: Technical Program
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